Nanoimprint lithography

Nanoimprint lithography combines the small critical dimensions of e-beam lithography with the high throughput of optical stepper technology, allowing for a cost effective solution for fine-line lithography. For customers with their own nanoimprint lithography tool, CPFC offers a template-making service. CPFC's wafer fabrication expertise, coupled with its step and flash nanoimprint lithography tool, can provide customers with custom wafers fabricated using the imprint process. The combination of an in-house template fabrication capability using optical and e-beam lithography tools, and a full service wafer fabrication facility focused on manufacturing devices, makes CPFC unique in the world.

Template making service

CPFC's e-beam lithography and foundry capabilities allow customized and fully verified nanoimprint lithography templates with critical dimensions less than 60 nanometres. CPFC can fabricate templates for a number of different nanoimprint lithography approaches, including step and flash, hot embossing and UV nanoimprinting. Verification through the use of SEM, AFM and other metrology techniques is conducted to ensure that CPFC-produced templates fully comply with the customer's specifications.

"Step and Flash" nanoimprint lithography

CPFC has chosen the "step and flash" method of nanoimprint lithography to extend its lithography capability to below 60nm. Step and flash nanoimprint lithography provides the optimum combination of resolution, throughput and flexibility with existing lithographic tool sets, thereby simplifying the integration of nanostructures into sophisticated photonic and electronic devices.