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Yoga Yogendran
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Reactive Spray Deposition Technology (RSDT)
Summary
Reactive spray deposition technique (RSDT) is a proprietary (patent pending) technology developed by the National Research Council's Institute for Fuel Cell Innovation (NRC-IFCI). RSDT is a method of depositing films or producing nanopowders through the combustion of metal-organic or metal-inorganic compounds dissolved in solvent.
RSDT is an exceptional technology for direct film depositions. RSDT can be a cost efficient substituent for plasma / HVOF, CVD / PVD and similar techniques. NRC-IFCI has specifically designed RSDT for PEMFC and SOFC markets.
IP Status
Patent Pending
WO 2007045089
US 20080280056
CA2626603
EP1940556
CN101330983
KR20080078803
Provisional US Patent Application #61/136,709
Provisional US Patent Applications #61/193,240
Fact Sheet
For more information, please refer to our Reactive Spray Deposition Technology (RSDT) Fact Sheet (Requires Adobe Acrobat Reader).
