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Jean-Marc Baribeau
Phone: 613-993-8249
Fax: 613-941-4667
Email: Jean-Marc.Baribeau@nrc-cnrc.gc.ca
X-Ray Photoelectron Spectroscopy
X-ray photoelectron spectroscopy (XPS) is used to probe the chemical species present at a surfaces. Chemical bonding between atoms can be determined form the energy shift of photoelectron lines in an XPS spectrum. The sampling depth with this technique is typically 0.5-5 nm and the detection limit is about 0.1 atomic percent. Elemental and chemical information on elements with Z>3 can be obtained. The institute operates a Physical Electronics 5500 XPS system. The instrument uses an AlKα x-ray source and a hemispherical electrostatic analyzer. It is equipped with a duoplasmatron ion gun (Ar, 1-4KV, ~10-200nA) for sputter depth profiling.
Surface composition and chemical states of surface species, primarily semiconductors, but also organic materials.
Quantitative and qualitative surface chemical analysis for both semiconductors and organic materials.
