Nanofabrication
- 4,000sq/ft of clean room (class 10,000/1000)
- Direct write e-beam lithography – JEOL 6000FSE & JEOL 840
- Contact lithography - Karl Suss MJB3
- Maskless Optical Lithography - Intelligent Micro-Patterning SF-100
- ICP-RIE – Oxford Instruments PlasmaLab 100
- CAIBE - Oxford Instruments IonFab 300
- PECVD - Oxford Instruments PlasmaLab 100 & PlasmaTherm
- E-beam, thermal, and sputter deposition of metals – e.g. Edwards Auto-306
- RTA – AG Associates 410, Jipelec JetFirst
- Cleaving, thinning, and wire bonding
- SEM – Hitachi 4700FE & JEOL 6400FE
- AFM – Pacific Nanotechnology
- VASE - Variable angle spectroscopic ellipsometry - Woollam
- Stress measurement – Tencor
- Sem-automatic Flip-Chip Bonder - Laurier M9
Building Name:
A.G.L. McNaughton Building
Building No.:
M-50
Related Information
Institutes: