Inorganic deposition
- Molecular Beam Epitaxy (MBE)
- III-N epitaxy (SVTA S35N)
- GaAs-based (VG V80H)
- III-V compounds (VG V90)
- Chemical Beam Epitaxy (CBE)
- InP-based (Riber32P)
- III-V compound (Hitachi-Ulvac)
- AC Magnetron sputtering system - ADS-800
- Dual-ion-beam sputtering system - Ion Tech Spector
- Ion-plating system - Balzers BAP 800
- Ion-assisted system - Balzers BAK 760
- UHV cluster tool – custom design - with low pressure MOCVD and ALD
Organic deposition
- Sputtering (multi-target) - with a JY MM-16 in-situ ellipsometer
- RF magnetron sputtering - conducting oxides
- Thermal Evaporation - Edwards Auto-306 & Auto-500 Multi-Sources
- PDS 2010 Parylene Deposition System
- Spin Coater - Headway EC101DT
- Cluster Tool - Kurt J. Lesker (device fabrication)
Building Name:
A.G.L. McNaughton Building
Building No.:
M-50
Related Information
Institutes: