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Semiconductor-related Deposition

Inorganic deposition

  • Molecular Beam Epitaxy (MBE)
  • III-N epitaxy (SVTA S35N)
  • GaAs-based (VG V80H)
  • III-V compounds (VG V90)
  • Chemical Beam Epitaxy (CBE)
  • InP-based (Riber32P)
  • III-V compound (Hitachi-Ulvac)
  • AC Magnetron sputtering system - ADS-800
  • Dual-ion-beam sputtering system - Ion Tech Spector
  • Ion-plating system - Balzers BAP 800
  • Ion-assisted system - Balzers BAK 760
  • UHV cluster tool – custom design - with low pressure MOCVD and ALD

Organic deposition

  • Sputtering (multi-target) - with a JY MM-16 in-situ ellipsometer
  • RF magnetron sputtering - conducting oxides
  • Thermal Evaporation - Edwards Auto-306 & Auto-500 Multi-Sources
  • PDS 2010 Parylene Deposition System
  • Spin Coater - Headway EC101DT
  • Cluster Tool - Kurt J. Lesker (device fabrication)

Building Name:

A.G.L. McNaughton Building

Building No.:

M-50

Related Information

Institutes: