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PANalytical MRD High-Resolution X-Ray Diffractometer

PANalytical MRD High-Resolution X-Ray Diffractometer

The Panalytical (formerly Philips) MRD system a high-resolution x-ray diffractometer that offers two-dimensional reciprocal space mapping capability. The x-ray source uses a monochromatic Cu kα1 radiation with an angular divergence of 12 arcsecs provided by a 4-bounce Ge(220) Bartels monochromator. The sample stage can accommodate full size wafer up to a 150 mm diameter and offers a full size x-y mapping capability. The secondary optics can be switched between a receiving slit mode (ideal for high-resolution diffraction scans of high-quality epitaxial thin films, multilayers and nanostructures) and a triple-axis analyzer crystal, preferred for reciprocal space mapping. The substrate x-y stage enables to produce two-dimensional real-space maps of the characteristics of Bragg peaks and other scattering features.

Goniometer

Determination of thickness, crystallographic orientation and quality of thin films, and in particular epitaxial layers. High resolution (5 or 12 arc-sec) coplanar diffraction in symmetric or asymmetric geometry to determine the lattice constant and strain of epitaxial thin films, grazing incidence x-ray reflectometry for the determination of surface roughness and thin film density and thickness.

Structural characterization of epitaxial thin films and layered media. Provide high angular resolution necessary to measure strain and small deviations (one part in 104) from bulk lattice constant.

Building Name:

A.G.L. McNaughton Building

Building No.:

M-50

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