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BAP Ion-Plating Deposition System (IMS)
Ion plating is a physical vapour deposition (PVD) process that utilizes concurrent bombardment of the substrate and depositing film by atomic-sized energetic particles. A low voltage arc plasma beam is generated between a cathode and the melt of a coating metal in an electron beam evaporator, working as an anode. Ions of a working gas (usually Argon) and evaporated materials created in the plasma and accelerated towards the substrate holder by a negative self-biased potential. By adding a reactive gas in the plasma, films of compound materials can be deposited.
The BAP ion plating is used to deposit optical coatings with high densities, on large surfaces, and conformal coatings on complex surfaces.
