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Jean Lapointe
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Direct-write optical lithography system
The direct-write optical lithography system is a versatile research tool that simply requires the electronic file of the pattern to be transferred to the photo-sensitive resist. A SF-100 direct lithography tool from Intelligent Micro-patterning is available for use in the Nanofabrication facility. The system allows coarse patterning (10 um approximately) quickly and easily, without the need for a photomask plate. The UV light emitted by a mercury lamp is reflecting on a Digital Micro-mirror Display (DMD) programmed to replicate the design file. The reflected image (UV light) is then focused onto the coated sample. The maximum field size (for the 10 um resolution) is 4x5 mm, with the capability of stitching adjacent fields and patterning areas as large as 150 mm X 150 mm. Alignment to previously patterned structures is possible.
