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Jean Lapointe
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Chemically Assisted Ion Beam Etching (CAIBE)
The Chemically Assisted Ion Beam Etcher operated in the Nanofabrication Facility is an Ionfab 300 from Oxford Instruments. The system can perform ion milling, reactive ion beam etching or chemically assisted ion beam etching. The latter is the main operation mode with chlorine being the reactive gas.
This system has been used to etch various materials: InP, GaAs, GaN, Al and Si (inclined etching). It allows an independent control of the parameters controlling the chemical and the physical mechanisms responsible for the etching process. Moreover, the system has a unique capability: sample tilting relative to the ion beam, allowing inclined etching. The system can handle samples from pieces up to 75 mm wafers. The Ion beam energy can be varied from 500 to 1000 eV and the operating temperature from 0 to 200 deg C. This system has shown high reproducibility and reliability over the years.
