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Jean-Marc Baribeau
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Scanning Auger Microscope and Spectrometer
Scanning Auger Electron Spectroscopy for elemental and chemical state evaluation of semiconductors, thin films, and nanostructured materials.Electron impact on a solid surface can cause ionization of atomic energy levels of atoms in the solid. An ionized atom can relax by the ejection either of an X-ray photon or of an Auger electron; the latter process is far more probable at low primary energies, e.g. less than 10 keV. In the Auger process the ionized level is filled by an electron from an outer level and the excess energy is given to another electron either in the same level or in a still more shallow one. Using tables of atomic energy levels to calculate the expected energies of Auger transitions, analysis of the observed Auger spectrum from a solid enables its atomic composition to be established. The institute operates a Phi 650 and a state-of-the-art Ulvac-PHI 700 Auger nanoprobe. The Phi 650 has a 50 nm spatial resolution and is used for routine surface and depth profiling of contaminants. The Phi 700 system possesses the following specifications: spatial resolution at the nanometer scale capable of scanning Auger imaging; cylindrical electron analyzer with coaxial electron beam to enable Auger analysis of samples with high aspect ratio; charge neutralization by ion beam bombardment to study insulating thin films; low energy analysis and ion beam sputtering for shallow depth profiling.\
Auger spectroscopy is used for quantitative depth profiling of dopants/impurities (one percent sensitivity) in advanced semiconductor thin films, perform chemical profiling of focused-ion beam samples and to enable the chemical imaging at the nanometer scale resolution better than 10 nm) of nanostructures and devices at the sub-micon scale.
Auger spectroscopy is used to advance internal institute projects and to support materials development for the CPFC and its clients.
