Research Council Officer (RCO), Canadian Photonics Fabrication Centre (CPFC)
Information and Communications Technologies
Ottawa - Ontario
Help bring research to life and drive your career forward with the National Research Council of Canada (NRC), Canada's premier research and technology organization.
We are looking for four (4) dynamics Research Council Officers (RCO) to support the Canadian Photonics Fabrication Centre (CPFC) within NRC’s Information and Communications Technologies portfolio (NRC-ICT). The Research Council Officer would be someone who shares our core values of impact, accountability, leadership, integrity and collaboration.
The CPFC is seeking Research Council Officers to join a team who will develop advanced fabrication processes and provide prototype photonic and optoelectronic components in a variety of material systems. Clients will include private industry, government and post graduate institutions. The primary responsibility of the RCO will be to develop and sustain processes to fabricate a range of devices on InP, GaAs, Si or other substrates to meet customer requirements. By extending the range of processes offered by the CPFC, and the hours of operation, the response time to meet clients’ needs will be reduced.
The CPFC offers our clients and partners access to cutting-edge photonics fabrication services providing simulation, design, fabrication, testing, characterization and prototyping services to help move innovative photonic and electronic devices to market. It plays a key role in NRC’s Advanced Photonic Components and Gallium Nitride Electronics Programs.
The elements of the CPFC infrastructure include: class 100 and class 1000 cleanrooms, semiconductor optoelectronic growth facilities (MOCVD), dielectric waveguide deposition services (PECVD, ECR), lithography (contact aligner, i-line stepper, e-beam), wet and dry (ICP) etching, metallization (e-beam evaporation, sputtering and electroplating), wafer thinning, dicing and other standard semiconductor fabrication equipment and device testing.
*These four positions are for evening shift and we would like to create a list of qualified candidates for the night shift.
Stream 1: RCO, Litho, Etch and Metallization, Evening shift – 1 position
Stream 2: RCO, Process systems, Evening shift – 1 position
Stream 3: RCO, III-V etch process systems, Evening shift – 1 position
Stream 4: RCO, MOCVD systems, Evening shift – 1 position
Applicants must demonstrate within the content of their application that they meet the following screening criteria in order to be given further consideration as candidates:
Bachelor’s degree in the Physical, Chemical, or Materials Sciences or equivalent engineering disciplines.
A PhD in one of these disciplines will be considered an asset.
*You must meet the following common criteria plus the specific stream criteria identified below:
Common to all streams:
Significant relevant hands-on experience in an industrial R&D or semiconductor fabrication environment.
Significant experience in semiconductor device process development.
Significant experience in integrating complex process steps in the fabrication of semiconductor-based photonics devices.
Significant hands-on experience in developing, supporting and sustaining processes for fabrication of III-V compound semiconductor devices.
Specific to Stream 1:
Extensive experience with ASML Stepper.
Specific to Stream 2:
Extensive Experience in InP process systems and techniques would be an asset.
Specific to Stream 3:
Extensive experience with wet and dry etch processes (ICP, RIE), including knowledge of differences and when to use each type of etch.
Specific to Stream 2 and 3:
Basic experience in diverse areas of fabrication such as Dielectric deposition and etch, metallization, III-V etch and lithography.
Extensive hands-on experience in developing, supporting and sustaining processes for fabrication of III-V compound semiconductor devices.
Basic experience in setup and commissioning on new III-V etch tools.
Specific to Stream 4:
Extensive Experience in Epitaxial Growth (MOCVD) process systems and techniques would be an asset.
For alternate qualifications please refer to equivalency heading below.
An equivalent combination of work related experience, training and education may be considered.
Condition of employment
Candidates will be assessed on the basis of the following criteria:
Common to all Streams:
Knowledge in thin film deposition, etching and lithography processes and their characterization techniques as they relate to III-V etch processes.
Knowledge of safe practices for working with chemicals, compressed gases; liquid nitrogen, and electrical, mechanical, and vacuum systems.
Knowledge of the use of design of experiments, process control checks, trend charts, WIP tracking and paperless MES.
Solid knowledge and ability of the safe handling of the extremely toxic materials used in the course of device fabrication is essential.
Ability to recognize problems with complex processes or fabrication tools and assist with/determine possible causes and solutions.
Ability to understand the dynamic interaction of process steps across various fabrication areas.
Ability to plan, schedule, and carry out all steps needed for the prototyping of microfabricated semiconductor devices.
Specific to Stream 1:
Solid knowledge of lithographic and/or holographic techniques and processes.
Specific to Stream 3:
Knowledge of steps involved in setup and commissioning on new III-V etch tools.
Creative Thinking (Level 2)
Partnering (Level 2)
Communication (Level 2)
Results Orientation (Level 2)
Teamwork (Level 2)
For this position, NRC will evaluate candidates using the following competency profile(s): | Research
Relocation assistance will be determined in accordance with NRC's directives.
05/31/2017 (3 days)
Applications will be accepted until 23:59 Eastern Time
To obtain a copy of the job description
Please direct your questions, with the hiring number (101-16-1266) to:
Telephone: (613) 991-1123
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